Epitaxy Workshop 2026The workshop welcomes scientific and technical contributions covering the full spectrum of epitaxial growth and related technologies, including MBE, MOCVD, sputtering, and other deposition methods. Contributions may address topics along the entire development chain — from substrates and source materials to growth methodology, process technology, process control, and characterization.
Both fundamental studies and device-oriented work are highly encouraged. The scope is not limited to III–V semiconductors; contributions on a broad variety of material classes are welcome.
A key aim of the workshop is to foster exchange between senior experts, early-career researchers, engineers, and technical staff. In this spirit, we particularly encourage contributions with a strong workshop character, including presentations on technical challenges, equipment operation and maintenance, troubleshooting, process know-how, and hands-on experience.
Guidelines
Authors are requested to prepare a single page abstract in English as a single PDF file. The abstract should consist of text and can include figures and tables. Title, author(s) and affiliation(s) must also be included.
Abstract Submission
The PDF abstract file should be sent by email to event@iaf.fraunhofer.de by August 31, 2026. When submitting your abstract by email please indicate whether you prefer an oral or a poster presentation.